Electron-induced interaction of selected hydrocarbons with TiO2 surfaces: the relevance to extreme ultraviolet lithography.

The aim of this work is to characterize desorption induced by electronic transition processes that affect the reflectivity of TiO2-capped multilayer mirrors used in extreme ultraviolet (EUV) lithography. A low energy electron beam is employed to mimic excitations initiated by EUV radiation. Temperature programmed desorption, x-ray photoelectron spectroscopy, and low energy ion scattering are used to analyze the surface reactions. Carbon film growth on the TiO2(011) crystalline surface is measured during 10-100 eV electron bombardment in benzene or methyl methacrylate vapor over a wide range of pressures and temperatures near 300 K. Low energy secondary electrons excited by EUV photons contribute substantially to the carbon accumulation on clean TiO2 cap layers. For benzene on clean TiO2, secondary electron effects dominate in the initial stages of carbon accumulation, whereas for C-covered TiO2, direct excitations appear to dominate. We report on the adsorption energy, the steady-state coverage of the molecules on the surface and the cross sections for electron-stimulated dissociation: all key parameters for understanding and modeling the processes relating to the EUV lithography mirrors.

Adsorption and electron-induced polymerization of methyl methacrylate on Ru(1010).

The adsorption and electron irradiation of methyl methacrylate (MMA) on a Ru(1010) surface have been studied using x-ray photoelectron spectroscopy (XPS), temperature programmed desorption (TPD), and low energy ion scattering. TPD analysis indicates that a monolayer of MMA chemisorbs and dissociates on the Ru(1010) surface. The reaction products observed upon heating include H(2), CO, CO(2), and a small amount of MMA. Physisorbed multilayers of MMA desorb at temperatures around 170 K. Electron irradiation of physisorbed MMA at 140 K leads to a modification of the MMA film: The XPS spectra show an increase in thermal stability of the film with retention of the MMA structure, and indicate that electron irradiation induces polymerization. An increase in the electron bombardment fluence induces a degradation of the formed polymerized species and leads to the accumulation of carbon on the Ru surface. These results are relevant to the accumulation of carbon on surfaces of Ru films that serve as capping layers on MoSi multilayer mirrors used in extreme ultraviolet lithography.

Adsorption and reaction of SO2 with a polycrystalline UO2 film: promotion of S-O bond cleavage by creation of O-defects and Na or Ca coadsorption.

To characterize UO(2) for its possible use in desulfurization applications, the interactions of molecular sulfur dioxide (SO(2)) with a polycrystalline uranium dioxide film have been studied by means of X-ray photoelectron spectroscopy (XPS), temperature-programmed desorption (TPD), and low-energy ion scattering (LEIS). The stoichiometric, oxygen-deficient, calcium-precovered and sodium-precovered UO(2) surfaces have been characterized. The changes in oxide reactivity upon creation of oxygen vacancies and coadsorption of sodium and calcium have been studied. After creation of a reduced UO(2-x) surface (x approximately 0.44) via Ar(+) sputtering, the U 4f XPS spectrum shows conspicuous differences that are good indicators of the surface stoichiometry. Molecular SO(x) formation (x = 2-4) is observed after SO(2) deposition onto stoichiometric UO(2) and onto UO(2) precovered with small amounts (<1 ML) of Na or Ca; complete dissociation of SO(2) is not observed. Heating leads to desorption of the SO(x) species and to transformation of SO(2) to SO(3) and SO(3) to SO(4). On oxygen-deficient UO(2) and on UO(2) precovered with large Na or Ca coverages (> or =4 ML), both the formation of SO(x)= species and complete dissociation of SO(2) are observed. A higher thermal stability of the sulfur components is observed on these surfaces. In all cases for which dissociation occurs, the XPS peak of atomic sulfur shows similar structure: three different binding states are observed. The reactivity of oxygen-deficient UO(2) and sodium- and calcium-precovered UO(2) (coverages > or = 4 ML) is attributed to charge transfer into the antibonding LUMO of the adsorbed molecule.

Photon-stimulated desorption as a substantial source of sodium in the lunar atmosphere.

Mercury and the Moon both have tenuous atmospheres that contain atomic sodium and potassium. These chemicals must be continuously resupplied, as neither body can retain the atoms for more than a few hours. The mechanisms proposed to explain the resupply include sputtering of the surface by the solar wind, micrometeorite impacts, thermal desorption and photon-stimulated desorption. But there are few data and no general agreement about which processes dominate. Here we report laboratory studies of photon-stimulated desorption of sodium from surfaces that simulate lunar silicates. We find that bombardment of such surfaces at temperatures of approximately 250 K by ultraviolet photons (wavelength lambda < 300 nm) causes very efficient desorption of sodium atoms, induced by electronic excitations rather than by thermal processes or momentum transfer. The flux at the lunar surface of ultraviolet photons from the Sun is sufficient to ensure that photon-stimulated desorption of sodium contributes substantially to the Moon's atmosphere. On Mercury, solar heating of the surface implies that thermal desorption will also be an important source of atmospheric sodium.